What Is ALD Coating?
Atomic Layer Deposition (ALD) is a controlled form of chemical vapor deposition (CVD). ALD uses timed pulses of reactive precursors to encapsulate all exposed surfaces of a substrate for coating. It gets its name from the nature of these pulses, each of which deposits a single self-terminating layer.
By alternating the chemicals present in the chamber, the chemistry and thickness of the coating can be controlled with atomic precision. Because ALD uses gas-phase chemistry to make coatings, it is able to deposit coatings on all surfaces which the gas can reach providing the opportunity to precisely coat parts even with extremely complex shapes.