COATING OPTIONS WITH ALD

Atomic Layer Deposition affords a wide range of coating compositions. It is commonly used to manufacture encapsulating coatings of insulators to exclude liquids or gasses from sensitive components. ALD uses no plasmas making it ideal for a variety of delicate substrates. Commonly made coatings via ALD include:

  • Silicon Oxide
  • Aluminum Oxide
  • Titanium Nitride
  • Lithium Fluoride