What Is Sputtering?
Sputtering is a versatile form of physical vapor deposition which can be used to deposit coatings of conductive or insulating materials. It uses ionized gas to ablate (“sputter”) a target to create a thin film of that material on a substrate. Because there is no requirement for either the coating or substrate material to be electrically conductive, sputtering can be used to deposit coatings of very high chemical purity onto essentially any substrate.
Sputtering itself contains multiple sub-types, each with its own applicability. Among the many are direct current (DC), radio frequency (RF), mid-frequency (MF), pulsed DC and HiPIMS. We design our coating process to meet your specific needs and have the experience and equipment to execute any of these.